Introduction To Focused Ion Beams

Author: Lucille A. Giannuzzi
Publisher: Springer Science & Business Media
ISBN: 9780387233130
Size: 56.93 MB
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Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.

Introduction To Focused Ion Beam Nanometrology

Author: David C. Cox
Publisher: Morgan & Claypool Publishers
ISBN: 1681741482
Size: 11.20 MB
Format: PDF, ePub
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This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.

High Resolution Focused Ion Beams Fib And Its Applications

Author: Jon Orloff
Publisher: Springer Science & Business Media
ISBN: 9780306473500
Size: 17.22 MB
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In this book, we have attempted to produce a reference on high resolution focused ion beams (FIBs) that will be useful for both the user and the designer of FIB instrumentation. We have included a mix of theory and applications that seemed most useful to us. The field of FIBs has advanced rapidly since the application of the first field emission ion sources in the early 1970s. The development of the liquid metal ion source (LMIS) in the late 1960s and early 1970s and its application for FIBs in the late 1970s have resulted in a powerful tool for research and for industry. There have been hundreds of papers written on many aspects of LMIS and FIBs, and a useful and informative book on these subjects was published in 1991 by Phil Prewett and Grame Mair. Because there have been so many new applications and uses found for FIBs in the last ten years we felt that it was time for another book on the subject.

Compact Plasma And Focused Ion Beams

Author: Sudeep Bhattacharjee
Publisher: Taylor & Francis
ISBN: 1466557923
Size: 18.46 MB
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Recent research has brought the application of microwaves from the classical fields of heating, communication, and generation of plasma discharges into the generation of compact plasmas that can be used for applications such as FIB and small plasma thrusters. However, these new applications bring with them a new set of challenges. With coverage ranging from the basics to new and emerging applications, Compact Plasma and Focused Ion Beams discusses how compact high-density microwave plasmas with dimensions smaller than the geometrical cutoff dimension can be generated and utilized for providing focused ion beams of various elements. Starting with the fundamentals of the cutoff problem for wave propagation in waveguides and plasma diagnostics, the author goes on to explain in detail the plasma production by microwaves in a compact geometry and narrow tubes. He then thoroughly discusses wave interaction with bounded plasmas and provides a deeper understanding of the physics. The book concludes with an up-to-date account of recent research on pulsed microwaves and the application of compact microwave plasmas for multi-element FIB. It provides a consolidated and unified description of the emerging areas in plasma science and technology utilizing wave-based plasma sources based on the author’s own work and experience. The book will be useful not only to established researchers in this area but will also serve as an excellent introduction to those interested in applying these ideas to various current and new applications.

Nanofabrication Using Focused Ion And Electron Beams

Author: Ivo Utke
Publisher: OUP USA
ISBN: 0199734216
Size: 64.46 MB
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This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.

Handbook Of Charged Particle Optics

Author: Jon Orloff
Publisher: CRC Press
ISBN: 9780849325137
Size: 80.65 MB
Format: PDF, Mobi
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This timely handbook contains chapters on the essential elements of high resolution charged particle optics and is written by many of the world's leading research scientists. It is a complete guide to understanding, designing, and using high resolution instrumentation such as transmission electron microscopes (TEMs), scanning electron microscopes (SEMs), scanning transmission electron microscopes (STEMs), and focused ion beam (FIB) systems. This handbook is evenly balanced between theory and application, and covers all the most important topics in this growing area. Handbook of High Resolution Charged Particle Optics explains how and why high resolution instruments work and how to apply this information when designing or using them.

Fib Nanostructures

Author: Zhiming M. Wang
Publisher: Springer Science & Business Media
ISBN: 331902874X
Size: 61.13 MB
Format: PDF, Mobi
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FIB Nanostructures reviews a range of methods, including milling, etching, deposition, and implantation, applied to manipulate structures at the nanoscale. Focused Ion Beam (FIB) is an important tool for manipulating the structure of materials at the nanoscale, and substantially extends the range of possible applications of nanofabrication. FIB techniques are widely used in the semiconductor industry and in materials research for deposition and ablation, including the fabrication of nanostructures such as nanowires, nanotubes, nanoneedles, graphene sheets, quantum dots, etc. The main objective of this book is to create a platform for knowledge sharing and dissemination of the latest advances in novel areas of FIB for nanostructures and related materials and devices, and to provide a comprehensive introduction to the field and directions for further research. Chapters written by leading scientists throughout the world create a fundamental bridge between focused ion beam and nanotechnology that is intended to stimulate readers' interest in developing new types of nanostructures for application to semiconductor technology. These applications are increasingly important for the future development of materials science, energy technology, and electronic devices. The book can be recommended for physics, electrical engineering, and materials science departments as a reference on materials science and device design.

Ion Beam Modification Of Materials

Author: J.S. Williams
Publisher: Newnes
ISBN: 0444599746
Size: 20.26 MB
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This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.

Analytical Techniques For Semiconductor Materials And Process Characterization 6 Altech 2009

Author: Bernd O. Kolbesen
Publisher: The Electrochemical Society
ISBN: 1566777402
Size: 60.71 MB
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The proceedings of ALTECH 2009 address recent developments and applications of analytical techniques for semiconductor materials, processes and devices. The papers comprise techniques of elemental and structural analysis for bulk and surface impurities and defects, thin films as well as dopants in ultra-shallow junctions.

Istfa 2006

Author: Electronic Device Failure Analysis Society
Publisher: ASM International
ISBN: 1615030891
Size: 21.87 MB
Format: PDF
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